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1 Publikation


2001 | Artikel | FH-PUB-ID: 3546
Hamelmann, Frank, et al. “Silicon Oxide Nanolayers for Soft X-Ray Optics Produced by Plasma Enhanced CVD.” Le Journal de Physique IV, vol. 11, no. 3, EDP Sciences, 2001, pp. 431–36, doi:10.1051/jp4:2001354.
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