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1 Publikation
2001 | Artikel | FH-PUB-ID: 3546
Hamelmann, Frank, A. Aschentrup, J. Schmalhorst, U. Kleineberg, U. Heinzmann, K. Dittmar, and P. Jutzi. “Silicon Oxide Nanolayers for Soft X-Ray Optics Produced by Plasma Enhanced CVD.” Le Journal de Physique IV 11, no. 3 (2001): 431–36. https://doi.org/10.1051/jp4:2001354.
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