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1 Publikation
2001 | Artikel | FH-PUB-ID: 3546
Hamelmann, F., Aschentrup, A., Schmalhorst, J., Kleineberg, U., Heinzmann, U., Dittmar, K., & Jutzi, P. (2001). Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD. Le Journal de Physique IV, 11(3), 431–436. https://doi.org/10.1051/jp4:2001354
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