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1 Publikation
2000 | Artikel | FH-PUB-ID: 3551
Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films
A. Klipp, F. Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, P. Jutzi, U. Heinzmann, Chemical Vapor Deposition 6 (2000) 63–66.
HSBI-PUB
| DOI
A. Klipp, F. Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, P. Jutzi, U. Heinzmann, Chemical Vapor Deposition 6 (2000) 63–66.