Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY
U. Kleineberg, D. Menke, F. Hamelmann, U. Heinzmann, O. Schmidt, G.. Fecher, G. Schoenhense, Journal of Electron Spectroscopy and Related Phenomena 101–103 (1999) 931–936.
Download
Es wurde kein Volltext hochgeladen. Nur Publikationsnachweis!
Artikel
| Veröffentlicht
| Englisch
Autor*in
Kleineberg, U;
Menke, D;
Hamelmann, Frank
;
Heinzmann, U;
Schmidt, O;
Fecher, G.H;
Schoenhense, G
;
Heinzmann, U;
Schmidt, O;
Fecher, G.H;
Schoenhense, GErscheinungsjahr
Zeitschriftentitel
Journal of Electron Spectroscopy and Related Phenomena
Band
101-103
Seite
931-936
ISSN
FH-PUB-ID
Zitieren
Kleineberg, U ; Menke, D ; Hamelmann, Frank ; Heinzmann, U ; Schmidt, O ; Fecher, G.H ; Schoenhense, G: Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY. In: Journal of Electron Spectroscopy and Related Phenomena Bd. 101–103, Elsevier BV (1999), S. 931–936
Kleineberg U, Menke D, Hamelmann F, et al. Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY. Journal of Electron Spectroscopy and Related Phenomena. 1999;101-103:931-936. doi:10.1016/S0368-2048(98)00374-0
Kleineberg, U., Menke, D., Hamelmann, F., Heinzmann, U., Schmidt, O., Fecher, G. ., & Schoenhense, G. (1999). Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY. Journal of Electron Spectroscopy and Related Phenomena, 101–103, 931–936. https://doi.org/10.1016/S0368-2048(98)00374-0
@article{Kleineberg_Menke_Hamelmann_Heinzmann_Schmidt_Fecher_Schoenhense_1999, title={Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY}, volume={101–103}, DOI={10.1016/S0368-2048(98)00374-0}, journal={Journal of Electron Spectroscopy and Related Phenomena}, publisher={Elsevier BV}, author={Kleineberg, U and Menke, D and Hamelmann, Frank and Heinzmann, U and Schmidt, O and Fecher, G.H and Schoenhense, G}, year={1999}, pages={931–936} }
Kleineberg, U, D Menke, Frank Hamelmann, U Heinzmann, O Schmidt, G.H Fecher, and G Schoenhense. “Photoemission Microscopy with Microspot-XPS by Use of Undulator Radiation and a High-Throughput Multilayer Monochromator at BESSY.” Journal of Electron Spectroscopy and Related Phenomena 101–103 (1999): 931–36. https://doi.org/10.1016/S0368-2048(98)00374-0.
U. Kleineberg et al., “Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY,” Journal of Electron Spectroscopy and Related Phenomena, vol. 101–103, pp. 931–936, 1999.
Kleineberg, U., et al. “Photoemission Microscopy with Microspot-XPS by Use of Undulator Radiation and a High-Throughput Multilayer Monochromator at BESSY.” Journal of Electron Spectroscopy and Related Phenomena, vol. 101–103, Elsevier BV, 1999, pp. 931–36, doi:10.1016/S0368-2048(98)00374-0.
Google Scholar