{"doi":"10.1016/S0169-4332(99)00243-3","volume":150,"publisher":"Elsevier BV","issue":"1-4","author":[{"first_name":"S","full_name":"Luby, S","last_name":"Luby"},{"last_name":"Jergel","full_name":"Jergel, M","first_name":"M"},{"full_name":"Anopchenko, A","last_name":"Anopchenko","first_name":"A"},{"full_name":"Aschentrup, A","last_name":"Aschentrup","first_name":"A"},{"first_name":"Frank","id":"208487","full_name":"Hamelmann, Frank","last_name":"Hamelmann"},{"full_name":"Majkova, E","last_name":"Majkova","first_name":"E"},{"first_name":"U","last_name":"Kleineberg","full_name":"Kleineberg, U"},{"first_name":"U","full_name":"Heinzmann, U","last_name":"Heinzmann"}],"page":"178-184","date_updated":"2023-09-01T10:20:28Z","language":[{"iso":"eng"}],"intvolume":"       150","type":"journal_article","publication_identifier":{"issn":["01694332"]},"publication_status":"published","year":"1999","_id":"3554","status":"public","publication":"Applied Surface Science","title":"Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing","date_created":"2023-09-01T10:06:52Z","user_id":"216459","citation":{"short":"S. Luby, M. Jergel, A. Anopchenko, A. Aschentrup, F. Hamelmann, E. Majkova, U. Kleineberg, U. Heinzmann, Applied Surface Science 150 (1999) 178–184.","alphadin":"<span style=\"font-variant:small-caps;\">Luby, S</span> ; <span style=\"font-variant:small-caps;\">Jergel, M</span> ; <span style=\"font-variant:small-caps;\">Anopchenko, A</span> ; <span style=\"font-variant:small-caps;\">Aschentrup, A</span> ; <span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Majkova, E</span> ; <span style=\"font-variant:small-caps;\">Kleineberg, U</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U</span>: Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing. In: <i>Applied Surface Science</i> Bd. 150, Elsevier BV (1999), Nr. 1–4, S. 178–184","ieee":"S. Luby <i>et al.</i>, “Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing,” <i>Applied Surface Science</i>, vol. 150, no. 1–4, pp. 178–184, 1999.","chicago":"Luby, S, M Jergel, A Anopchenko, A Aschentrup, Frank Hamelmann, E Majkova, U Kleineberg, and U Heinzmann. “Thermal Behaviour of Co/Si/W/Si Multilayers under Rapid Thermal Annealing.” <i>Applied Surface Science</i> 150, no. 1–4 (1999): 178–84. <a href=\"https://doi.org/10.1016/S0169-4332(99)00243-3\">https://doi.org/10.1016/S0169-4332(99)00243-3</a>.","apa":"Luby, S., Jergel, M., Anopchenko, A., Aschentrup, A., Hamelmann, F., Majkova, E., … Heinzmann, U. (1999). Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing. <i>Applied Surface Science</i>, <i>150</i>(1–4), 178–184. <a href=\"https://doi.org/10.1016/S0169-4332(99)00243-3\">https://doi.org/10.1016/S0169-4332(99)00243-3</a>","bibtex":"@article{Luby_Jergel_Anopchenko_Aschentrup_Hamelmann_Majkova_Kleineberg_Heinzmann_1999, title={Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing}, volume={150}, DOI={<a href=\"https://doi.org/10.1016/S0169-4332(99)00243-3\">10.1016/S0169-4332(99)00243-3</a>}, number={1–4}, journal={Applied Surface Science}, publisher={Elsevier BV}, author={Luby, S and Jergel, M and Anopchenko, A and Aschentrup, A and Hamelmann, Frank and Majkova, E and Kleineberg, U and Heinzmann, U}, year={1999}, pages={178–184} }","mla":"Luby, S., et al. “Thermal Behaviour of Co/Si/W/Si Multilayers under Rapid Thermal Annealing.” <i>Applied Surface Science</i>, vol. 150, no. 1–4, Elsevier BV, 1999, pp. 178–84, doi:<a href=\"https://doi.org/10.1016/S0169-4332(99)00243-3\">10.1016/S0169-4332(99)00243-3</a>.","ama":"Luby S, Jergel M, Anopchenko A, et al. Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing. <i>Applied Surface Science</i>. 1999;150(1-4):178-184. doi:<a href=\"https://doi.org/10.1016/S0169-4332(99)00243-3\">10.1016/S0169-4332(99)00243-3</a>"}}