{"publisher":"Wiley","issue":"2","author":[{"last_name":"Klipp","full_name":"Klipp, A.","first_name":"A."},{"first_name":"Frank","id":"208487","full_name":"Hamelmann, Frank","last_name":"Hamelmann"},{"first_name":"G.","last_name":"Haindl","full_name":"Haindl, G."},{"first_name":"J.","last_name":"Hartwich","full_name":"Hartwich, J."},{"last_name":"Kleineberg","full_name":"Kleineberg, U.","first_name":"U."},{"first_name":"P.","full_name":"Jutzi, P.","last_name":"Jutzi"},{"first_name":"U.","full_name":"Heinzmann, U.","last_name":"Heinzmann"}],"doi":"10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q","volume":6,"type":"journal_article","publication_identifier":{"eissn":["15213862"],"issn":["09481907"]},"page":"63-66","date_updated":"2023-09-01T10:23:21Z","language":[{"iso":"eng"}],"intvolume":" 6","publication_status":"published","year":"2000","title":"Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films","publication":"Chemical Vapor Deposition","date_created":"2023-09-01T10:04:14Z","citation":{"mla":"Klipp, A., et al. “Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films.” Chemical Vapor Deposition, vol. 6, no. 2, Wiley, 2000, pp. 63–66, doi:10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q.","ama":"Klipp A, Hamelmann F, Haindl G, et al. Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films. Chemical Vapor Deposition. 2000;6(2):63-66. doi:10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q","bibtex":"@article{Klipp_Hamelmann_Haindl_Hartwich_Kleineberg_Jutzi_Heinzmann_2000, title={Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films}, volume={6}, DOI={10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q}, number={2}, journal={Chemical Vapor Deposition}, publisher={Wiley}, author={Klipp, A. and Hamelmann, Frank and Haindl, G. and Hartwich, J. and Kleineberg, U. and Jutzi, P. and Heinzmann, U.}, year={2000}, pages={63–66} }","ieee":"A. Klipp et al., “Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films,” Chemical Vapor Deposition, vol. 6, no. 2, pp. 63–66, 2000.","chicago":"Klipp, A., Frank Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, P. Jutzi, and U. Heinzmann. “Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films.” Chemical Vapor Deposition 6, no. 2 (2000): 63–66. https://doi.org/10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q.","apa":"Klipp, A., Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., & Heinzmann, U. (2000). Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films. Chemical Vapor Deposition, 6(2), 63–66. https://doi.org/10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q","alphadin":"Klipp, A. ; Hamelmann, Frank ; Haindl, G. ; Hartwich, J. ; Kleineberg, U. ; Jutzi, P. ; Heinzmann, U.: Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films. In: Chemical Vapor Deposition Bd. 6, Wiley (2000), Nr. 2, S. 63–66","short":"A. Klipp, F. Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, P. Jutzi, U. Heinzmann, Chemical Vapor Deposition 6 (2000) 63–66."},"user_id":"216459","_id":"3551","status":"public"}