Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD
F. Hamelmann, G. Haindl, J. Schmalhorst, A. Aschentrup, E. Majkova, U. Kleineberg, U. Heinzmann, A. Klipp, P. Jutzi, A. Anopchenko, M. Jergel, S. Luby, Thin Solid Films 358 (2000) 90–93.
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Artikel
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Autor*in
Hamelmann, Frank
;
Haindl, G;
Schmalhorst, J;
Aschentrup, A;
Majkova, E;
Kleineberg, U;
Heinzmann, U;
Klipp, A;
Jutzi, P;
Anopchenko, A;
Jergel, M;
Luby, S
Alle
;
Haindl, G;
Schmalhorst, J;
Aschentrup, A;
Majkova, E;
Kleineberg, U;
Heinzmann, U;
Klipp, A;
Jutzi, P;
Anopchenko, A;
Jergel, M;
Luby, S
Alle
Erscheinungsjahr
Zeitschriftentitel
Thin Solid Films
Band
358
Zeitschriftennummer
1-2
Seite
90-93
ISSN
FH-PUB-ID
Zitieren
Hamelmann, Frank ; Haindl, G ; Schmalhorst, J ; Aschentrup, A ; Majkova, E ; Kleineberg, U ; Heinzmann, U ; Klipp, A ; u. a.: Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. In: Thin Solid Films Bd. 358, Elsevier BV (2000), Nr. 1–2, S. 90–93
Hamelmann F, Haindl G, Schmalhorst J, et al. Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. Thin Solid Films. 2000;358(1-2):90-93. doi:10.1016/S0040-6090(99)00695-1
Hamelmann, F., Haindl, G., Schmalhorst, J., Aschentrup, A., Majkova, E., Kleineberg, U., … Luby, S. (2000). Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. Thin Solid Films, 358(1–2), 90–93. https://doi.org/10.1016/S0040-6090(99)00695-1
@article{Hamelmann_Haindl_Schmalhorst_Aschentrup_Majkova_Kleineberg_Heinzmann_Klipp_Jutzi_Anopchenko_et al._2000, title={Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD}, volume={358}, DOI={10.1016/S0040-6090(99)00695-1}, number={1–2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Hamelmann, Frank and Haindl, G and Schmalhorst, J and Aschentrup, A and Majkova, E and Kleineberg, U and Heinzmann, U and Klipp, A and Jutzi, P and Anopchenko, A and et al.}, year={2000}, pages={90–93} }
Hamelmann, Frank, G Haindl, J Schmalhorst, A Aschentrup, E Majkova, U Kleineberg, U Heinzmann, et al. “Metal Oxide/Silicon Oxide Multilayer with Smooth Interfaces Produced by in Situ Controlled Plasma-Enhanced MOCVD.” Thin Solid Films 358, no. 1–2 (2000): 90–93. https://doi.org/10.1016/S0040-6090(99)00695-1.
F. Hamelmann et al., “Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD,” Thin Solid Films, vol. 358, no. 1–2, pp. 90–93, 2000.
Hamelmann, Frank, et al. “Metal Oxide/Silicon Oxide Multilayer with Smooth Interfaces Produced by in Situ Controlled Plasma-Enhanced MOCVD.” Thin Solid Films, vol. 358, no. 1–2, Elsevier BV, 2000, pp. 90–93, doi:10.1016/S0040-6090(99)00695-1.
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