{"publication_identifier":{"isbn":["9783527298549"],"eisbn":["9783527619917"]},"type":"book_chapter","language":[{"iso":"eng"}],"date_updated":"2023-09-01T10:05:23Z","page":"798-805","place":"Weinheim, Germany","author":[{"last_name":"Hamelmann","full_name":"Hamelmann, Frank","id":"208487","first_name":"Frank"},{"full_name":"Haindl, G.","last_name":"Haindl","first_name":"G."},{"first_name":"J.","full_name":"Hartwich, J.","last_name":"Hartwich"},{"first_name":"U.","full_name":"Kleineberg, U.","last_name":"Kleineberg"},{"first_name":"U.","last_name":"Heinzmann","full_name":"Heinzmann, U."},{"first_name":"A.","last_name":"Klipp","full_name":"Klipp, A."},{"full_name":"Petri, S. H. A.","last_name":"Petri","first_name":"S. H. A."},{"last_name":"Jutzi","full_name":"Jutzi, P.","first_name":"P."}],"publisher":"Wiley-VCH Verlag GmbH","editor":[{"first_name":"Norbert","full_name":"Auner, Norbert","last_name":"Auner"},{"full_name":"Weis, Johann","last_name":"Weis","first_name":"Johann"}],"doi":"10.1002/9783527619917.ch122","citation":{"apa":"Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Heinzmann, U., Klipp, A., … Jutzi, P. (2000). In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors. In N. Auner &#38; J. Weis (Eds.), <i>Organosilicon Chemistry IV</i> (pp. 798–805). Weinheim, Germany: Wiley-VCH Verlag GmbH. <a href=\"https://doi.org/10.1002/9783527619917.ch122\">https://doi.org/10.1002/9783527619917.ch122</a>","chicago":"Hamelmann, Frank, G. Haindl, J. Hartwich, U. Kleineberg, U. Heinzmann, A. Klipp, S. H. A. Petri, and P. Jutzi. “In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors.” In <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, 798–805. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000. <a href=\"https://doi.org/10.1002/9783527619917.ch122\">https://doi.org/10.1002/9783527619917.ch122</a>.","ieee":"F. Hamelmann <i>et al.</i>, “In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors,” in <i>Organosilicon Chemistry IV</i>, N. Auner and J. Weis, Eds. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000, pp. 798–805.","alphadin":"<span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Haindl, G.</span> ; <span style=\"font-variant:small-caps;\">Hartwich, J.</span> ; <span style=\"font-variant:small-caps;\">Kleineberg, U.</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U.</span> ; <span style=\"font-variant:small-caps;\">Klipp, A.</span> ; <span style=\"font-variant:small-caps;\">Petri, S. H. A.</span> ; <span style=\"font-variant:small-caps;\">Jutzi, P.</span>: In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors. In: <span style=\"font-variant:small-caps;\">Auner, N.</span> ; <span style=\"font-variant:small-caps;\">Weis, J.</span> (Hrsg.): <i>Organosilicon Chemistry IV</i>. Weinheim, Germany : Wiley-VCH Verlag GmbH, 2000, S. 798–805","short":"F. Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, U. Heinzmann, A. Klipp, S.H.A. Petri, P. Jutzi, in: N. Auner, J. Weis (Eds.), Organosilicon Chemistry IV, Wiley-VCH Verlag GmbH, Weinheim, Germany, 2000, pp. 798–805.","ama":"Hamelmann F, Haindl G, Hartwich J, et al. In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors. In: Auner N, Weis J, eds. <i>Organosilicon Chemistry IV</i>. Weinheim, Germany: Wiley-VCH Verlag GmbH; 2000:798-805. doi:<a href=\"https://doi.org/10.1002/9783527619917.ch122\">10.1002/9783527619917.ch122</a>","mla":"Hamelmann, Frank, et al. “In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors.” <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, Wiley-VCH Verlag GmbH, 2000, pp. 798–805, doi:<a href=\"https://doi.org/10.1002/9783527619917.ch122\">10.1002/9783527619917.ch122</a>.","bibtex":"@inbook{Hamelmann_Haindl_Hartwich_Kleineberg_Heinzmann_Klipp_Petri_Jutzi_2000, place={Weinheim, Germany}, title={In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors}, DOI={<a href=\"https://doi.org/10.1002/9783527619917.ch122\">10.1002/9783527619917.ch122</a>}, booktitle={Organosilicon Chemistry IV}, publisher={Wiley-VCH Verlag GmbH}, author={Hamelmann, Frank and Haindl, G. and Hartwich, J. and Kleineberg, U. and Heinzmann, U. and Klipp, A. and Petri, S. H. A. and Jutzi, P.}, editor={Auner, Norbert and Weis, JohannEditors}, year={2000}, pages={798–805} }"},"user_id":"216459","title":"In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors","date_created":"2023-09-01T10:02:22Z","publication":"Organosilicon Chemistry IV","status":"public","_id":"3549","year":"2000","publication_status":"published"}