{"publication_status":"published","year":"2004","title":"Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions","publication":"Vacuum","date_created":"2023-09-01T09:57:16Z","citation":{"alphadin":"<span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Aschentrup, A</span> ; <span style=\"font-variant:small-caps;\">Brechling, A</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U</span> ; <span style=\"font-variant:small-caps;\">Gushterov, A</span> ; <span style=\"font-variant:small-caps;\">Szekeres, A</span> ; <span style=\"font-variant:small-caps;\">Simeonov, S</span>: Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions. In: <i>Vacuum</i> Bd. 75, Elsevier BV (2004), Nr. 4, S. 307–312","short":"F. Hamelmann, A. Aschentrup, A. Brechling, U. Heinzmann, A. Gushterov, A. Szekeres, S. Simeonov, Vacuum 75 (2004) 307–312.","ieee":"F. Hamelmann <i>et al.</i>, “Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions,” <i>Vacuum</i>, vol. 75, no. 4, pp. 307–312, 2004.","apa":"Hamelmann, F., Aschentrup, A., Brechling, A., Heinzmann, U., Gushterov, A., Szekeres, A., &#38; Simeonov, S. (2004). Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions. <i>Vacuum</i>, <i>75</i>(4), 307–312. <a href=\"https://doi.org/10.1016/j.vacuum.2004.03.012\">https://doi.org/10.1016/j.vacuum.2004.03.012</a>","chicago":"Hamelmann, Frank, A Aschentrup, A Brechling, U Heinzmann, A Gushterov, A Szekeres, and S Simeonov. “Plasma-Assisted Deposition of Thin Silicon Oxide Films in a Remote PECVD Reactor and Characterization of Films Produced under Different Conditions.” <i>Vacuum</i> 75, no. 4 (2004): 307–12. <a href=\"https://doi.org/10.1016/j.vacuum.2004.03.012\">https://doi.org/10.1016/j.vacuum.2004.03.012</a>.","mla":"Hamelmann, Frank, et al. “Plasma-Assisted Deposition of Thin Silicon Oxide Films in a Remote PECVD Reactor and Characterization of Films Produced under Different Conditions.” <i>Vacuum</i>, vol. 75, no. 4, Elsevier BV, 2004, pp. 307–12, doi:<a href=\"https://doi.org/10.1016/j.vacuum.2004.03.012\">10.1016/j.vacuum.2004.03.012</a>.","ama":"Hamelmann F, Aschentrup A, Brechling A, et al. Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions. <i>Vacuum</i>. 2004;75(4):307-312. doi:<a href=\"https://doi.org/10.1016/j.vacuum.2004.03.012\">10.1016/j.vacuum.2004.03.012</a>","bibtex":"@article{Hamelmann_Aschentrup_Brechling_Heinzmann_Gushterov_Szekeres_Simeonov_2004, title={Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions}, volume={75}, DOI={<a href=\"https://doi.org/10.1016/j.vacuum.2004.03.012\">10.1016/j.vacuum.2004.03.012</a>}, number={4}, journal={Vacuum}, publisher={Elsevier BV}, author={Hamelmann, Frank and Aschentrup, A and Brechling, A and Heinzmann, U and Gushterov, A and Szekeres, A and Simeonov, S}, year={2004}, pages={307–312} }"},"user_id":"216459","_id":"3544","status":"public","publisher":"Elsevier BV","issue":"4","author":[{"id":"208487","first_name":"Frank","last_name":"Hamelmann","full_name":"Hamelmann, Frank"},{"full_name":"Aschentrup, A","last_name":"Aschentrup","first_name":"A"},{"full_name":"Brechling, A","last_name":"Brechling","first_name":"A"},{"full_name":"Heinzmann, U","last_name":"Heinzmann","first_name":"U"},{"full_name":"Gushterov, A","last_name":"Gushterov","first_name":"A"},{"first_name":"A","last_name":"Szekeres","full_name":"Szekeres, A"},{"first_name":"S","full_name":"Simeonov, S","last_name":"Simeonov"}],"doi":"10.1016/j.vacuum.2004.03.012","volume":75,"type":"journal_article","publication_identifier":{"issn":["0042207X"]},"date_updated":"2023-09-01T10:02:22Z","page":"307-312","intvolume":"        75","language":[{"iso":"eng"}]}