Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions
F. Hamelmann, A. Aschentrup, A. Brechling, U. Heinzmann, A. Gushterov, A. Szekeres, S. Simeonov, Vacuum 75 (2004) 307–312.
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Artikel
| Veröffentlicht
| Englisch
Autor*in
Hamelmann, Frank
;
Aschentrup, A;
Brechling, A;
Heinzmann, U;
Gushterov, A;
Szekeres, A;
Simeonov, S
;
Aschentrup, A;
Brechling, A;
Heinzmann, U;
Gushterov, A;
Szekeres, A;
Simeonov, SErscheinungsjahr
Zeitschriftentitel
Vacuum
Band
75
Zeitschriftennummer
4
Seite
307-312
ISSN
FH-PUB-ID
Zitieren
Hamelmann, Frank ; Aschentrup, A ; Brechling, A ; Heinzmann, U ; Gushterov, A ; Szekeres, A ; Simeonov, S: Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions. In: Vacuum Bd. 75, Elsevier BV (2004), Nr. 4, S. 307–312
Hamelmann F, Aschentrup A, Brechling A, et al. Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions. Vacuum. 2004;75(4):307-312. doi:10.1016/j.vacuum.2004.03.012
Hamelmann, F., Aschentrup, A., Brechling, A., Heinzmann, U., Gushterov, A., Szekeres, A., & Simeonov, S. (2004). Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions. Vacuum, 75(4), 307–312. https://doi.org/10.1016/j.vacuum.2004.03.012
@article{Hamelmann_Aschentrup_Brechling_Heinzmann_Gushterov_Szekeres_Simeonov_2004, title={Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions}, volume={75}, DOI={10.1016/j.vacuum.2004.03.012}, number={4}, journal={Vacuum}, publisher={Elsevier BV}, author={Hamelmann, Frank and Aschentrup, A and Brechling, A and Heinzmann, U and Gushterov, A and Szekeres, A and Simeonov, S}, year={2004}, pages={307–312} }
Hamelmann, Frank, A Aschentrup, A Brechling, U Heinzmann, A Gushterov, A Szekeres, and S Simeonov. “Plasma-Assisted Deposition of Thin Silicon Oxide Films in a Remote PECVD Reactor and Characterization of Films Produced under Different Conditions.” Vacuum 75, no. 4 (2004): 307–12. https://doi.org/10.1016/j.vacuum.2004.03.012.
F. Hamelmann et al., “Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions,” Vacuum, vol. 75, no. 4, pp. 307–312, 2004.
Hamelmann, Frank, et al. “Plasma-Assisted Deposition of Thin Silicon Oxide Films in a Remote PECVD Reactor and Characterization of Films Produced under Different Conditions.” Vacuum, vol. 75, no. 4, Elsevier BV, 2004, pp. 307–12, doi:10.1016/j.vacuum.2004.03.012.
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