Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases
F. Hamelmann, A. Aschentrup, A. Brechling, U. Heinzmann, M. Abrashev, A. Szekeres, K. Gesheva, Vacuum 76 (2004) 139–142.
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Artikel
| Veröffentlicht
| Englisch
Autor*in
Hamelmann, Frank
;
Aschentrup, A.;
Brechling, A.;
Heinzmann, U.;
Abrashev, M.;
Szekeres, A.;
Gesheva, K.
;
Aschentrup, A.;
Brechling, A.;
Heinzmann, U.;
Abrashev, M.;
Szekeres, A.;
Gesheva, K.Erscheinungsjahr
Zeitschriftentitel
Vacuum
Band
76
Zeitschriftennummer
2-3
Seite
139-142
ISSN
FH-PUB-ID
Zitieren
Hamelmann, Frank ; Aschentrup, A. ; Brechling, A. ; Heinzmann, U. ; Abrashev, M. ; Szekeres, A. ; Gesheva, K.: Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. In: Vacuum Bd. 76, Elsevier BV (2004), Nr. 2–3, S. 139–142
Hamelmann F, Aschentrup A, Brechling A, et al. Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. Vacuum. 2004;76(2-3):139-142. doi:10.1016/j.vacuum.2004.07.074
Hamelmann, F., Aschentrup, A., Brechling, A., Heinzmann, U., Abrashev, M., Szekeres, A., & Gesheva, K. (2004). Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. Vacuum, 76(2–3), 139–142. https://doi.org/10.1016/j.vacuum.2004.07.074
@article{Hamelmann_Aschentrup_Brechling_Heinzmann_Abrashev_Szekeres_Gesheva_2004, title={Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases}, volume={76}, DOI={10.1016/j.vacuum.2004.07.074}, number={2–3}, journal={Vacuum}, publisher={Elsevier BV}, author={Hamelmann, Frank and Aschentrup, A. and Brechling, A. and Heinzmann, U. and Abrashev, M. and Szekeres, A. and Gesheva, K.}, year={2004}, pages={139–142} }
Hamelmann, Frank, A. Aschentrup, A. Brechling, U. Heinzmann, M. Abrashev, A. Szekeres, and K. Gesheva. “Plasma-Assisted Deposition of Thin Carbon Films from Methane and the Influence of the Plasma Parameters and Additional Gases.” Vacuum 76, no. 2–3 (2004): 139–42. https://doi.org/10.1016/j.vacuum.2004.07.074.
F. Hamelmann et al., “Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases,” Vacuum, vol. 76, no. 2–3, pp. 139–142, 2004.
Hamelmann, Frank, et al. “Plasma-Assisted Deposition of Thin Carbon Films from Methane and the Influence of the Plasma Parameters and Additional Gases.” Vacuum, vol. 76, no. 2–3, Elsevier BV, 2004, pp. 139–42, doi:10.1016/j.vacuum.2004.07.074.
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