Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition
F. Hamelmann, A. Brechling, A. Aschentrup, U. Heinzmann, P. Jutzi, J. Sandrock, U. Siemeling, T. Ivanova, A. Szekeres, K. Gesheva, Thin Solid Films 446 (2004) 167–171.
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Artikel
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Autor*in
Hamelmann, Frank
;
Brechling, A.;
Aschentrup, A.;
Heinzmann, U.;
Jutzi, P.;
Sandrock, J.;
Siemeling, U.;
Ivanova, T.;
Szekeres, A.;
Gesheva, K.
;
Brechling, A.;
Aschentrup, A.;
Heinzmann, U.;
Jutzi, P.;
Sandrock, J.;
Siemeling, U.;
Ivanova, T.;
Szekeres, A.;
Gesheva, K.Erscheinungsjahr
Zeitschriftentitel
Thin Solid Films
Band
446
Zeitschriftennummer
2
Seite
167-171
ISSN
FH-PUB-ID
Zitieren
Hamelmann, Frank ; Brechling, A. ; Aschentrup, A. ; Heinzmann, U. ; Jutzi, P. ; Sandrock, J. ; Siemeling, U. ; Ivanova, T. ; u. a.: Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. In: Thin Solid Films Bd. 446, Elsevier BV (2004), Nr. 2, S. 167–171
Hamelmann F, Brechling A, Aschentrup A, et al. Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. Thin Solid Films. 2004;446(2):167-171. doi:10.1016/j.tsf.2003.09.045
Hamelmann, F., Brechling, A., Aschentrup, A., Heinzmann, U., Jutzi, P., Sandrock, J., … Gesheva, K. (2004). Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. Thin Solid Films, 446(2), 167–171. https://doi.org/10.1016/j.tsf.2003.09.045
@article{Hamelmann_Brechling_Aschentrup_Heinzmann_Jutzi_Sandrock_Siemeling_Ivanova_Szekeres_Gesheva_2004, title={Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition}, volume={446}, DOI={10.1016/j.tsf.2003.09.045}, number={2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Hamelmann, Frank and Brechling, A. and Aschentrup, A. and Heinzmann, U. and Jutzi, P. and Sandrock, J. and Siemeling, U. and Ivanova, T. and Szekeres, A. and Gesheva, K.}, year={2004}, pages={167–171} }
Hamelmann, Frank, A. Brechling, A. Aschentrup, U. Heinzmann, P. Jutzi, J. Sandrock, U. Siemeling, T. Ivanova, A. Szekeres, and K. Gesheva. “Thin Molybdenum Oxide Films Produced by Molybdenum Pentacarbonyl 1-Methylbutylisonitrile with Plasma-Assisted Chemical Vapor Deposition.” Thin Solid Films 446, no. 2 (2004): 167–71. https://doi.org/10.1016/j.tsf.2003.09.045.
F. Hamelmann et al., “Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition,” Thin Solid Films, vol. 446, no. 2, pp. 167–171, 2004.
Hamelmann, Frank, et al. “Thin Molybdenum Oxide Films Produced by Molybdenum Pentacarbonyl 1-Methylbutylisonitrile with Plasma-Assisted Chemical Vapor Deposition.” Thin Solid Films, vol. 446, no. 2, Elsevier BV, 2004, pp. 167–71, doi:10.1016/j.tsf.2003.09.045.
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