Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers
F. Hamelmann, A. Wonisch, W. Hachmann, U. Heinzmann, in: R. Kassing, P. Petkov, W. Kulisch, C. Popov (Eds.), Functional Properties of Nanostructured Materials, Springer Netherlands, Dordrecht, 2006, pp. 351–354.
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Buchbeitrag
| Veröffentlicht
| Englisch
Autor*in
Hamelmann, Frank;
Wonisch, A.;
Hachmann, W.;
Heinzmann, U.
Herausgeber*in
Kassing, Rainer;
Petkov, Plamen;
Kulisch, Wilhelm;
Popov, Cyril
Erscheinungsjahr
Buchtitel
Functional Properties of Nanostructured Materials
Seite
351-354
ISBN
ISSN
FH-PUB-ID
Zitieren
Hamelmann, Frank ; Wonisch, A. ; Hachmann, W. ; Heinzmann, U.: Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers. In: Kassing, R. ; Petkov, P. ; Kulisch, W. ; Popov, C. (Hrsg.): Functional Properties of Nanostructured Materials, NATO Science Series II: Mathematics, Physics and Chemistry. Dordrecht : Springer Netherlands, 2006, S. 351–354
Hamelmann F, Wonisch A, Hachmann W, Heinzmann U. Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers. In: Kassing R, Petkov P, Kulisch W, Popov C, eds. Functional Properties of Nanostructured Materials. NATO Science Series II: Mathematics, Physics and Chemistry. Dordrecht: Springer Netherlands; 2006:351-354. doi:10.1007/1-4020-4594-8_27
Hamelmann, F., Wonisch, A., Hachmann, W., & Heinzmann, U. (2006). Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers. In R. Kassing, P. Petkov, W. Kulisch, & C. Popov (Eds.), Functional Properties of Nanostructured Materials (pp. 351–354). Dordrecht: Springer Netherlands. https://doi.org/10.1007/1-4020-4594-8_27
@inbook{Hamelmann_Wonisch_Hachmann_Heinzmann_2006, place={Dordrecht}, series={NATO Science Series II: Mathematics, Physics and Chemistry}, title={Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers}, DOI={10.1007/1-4020-4594-8_27}, booktitle={Functional Properties of Nanostructured Materials}, publisher={Springer Netherlands}, author={Hamelmann, Frank and Wonisch, A. and Hachmann, W. and Heinzmann, U.}, editor={Kassing, Rainer and Petkov, Plamen and Kulisch, Wilhelm and Popov, CyrilEditors}, year={2006}, pages={351–354}, collection={NATO Science Series II: Mathematics, Physics and Chemistry} }
Hamelmann, Frank, A. Wonisch, W. Hachmann, and U. Heinzmann. “Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers.” In Functional Properties of Nanostructured Materials, edited by Rainer Kassing, Plamen Petkov, Wilhelm Kulisch, and Cyril Popov, 351–54. NATO Science Series II: Mathematics, Physics and Chemistry. Dordrecht: Springer Netherlands, 2006. https://doi.org/10.1007/1-4020-4594-8_27.
F. Hamelmann, A. Wonisch, W. Hachmann, and U. Heinzmann, “Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers,” in Functional Properties of Nanostructured Materials, R. Kassing, P. Petkov, W. Kulisch, and C. Popov, Eds. Dordrecht: Springer Netherlands, 2006, pp. 351–354.
Hamelmann, Frank, et al. “Plasma Assisted Deposition of Tungsten Oxide / Silicon Oxide Multilayer Films with Sub-Nanometer Single Layers.” Functional Properties of Nanostructured Materials, edited by Rainer Kassing et al., Springer Netherlands, 2006, pp. 351–54, doi:10.1007/1-4020-4594-8_27.
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